Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...

Chemical mechanical polishing (CMP) – also known as planarization – has long been the most commonly employed technique for smoothing and flattening wafer surfaces during the fabrication of ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

With its superb electrical characteristics, silicon is at the heart of most semiconductors. Its ability to control electrical characteristics has made it essential in modern electronics. Three ...

Many of today’s technological advances center around semiconductors. They contribute to almost all of their utilities as well as real performance. To produce the powerful tech, a number of ...