Abstract: We studied a multilayer perceptron model to predict the etch rates of SiO2 and Si3N4 thin films in CF4 plasma using data obtained from a voltage–current (VI) sensor and an optical emission ...
The PALLAS simulation framework is a Geant4-based toolkit for modeling plasma-accelerated particle beams. It integrates traditional Monte Carlo methods with machine learning-based ONNX beam generation ...
Abstract: Modeling microwave discharges in waveguide-based plasma sources is a complex multiphysics problem involving the intricate interplay of electromagnetic, thermal, and plasma dynamics, which is ...
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