Abstract: This paper investigates Hot Carrier Injection (HCI) behavior on 14nm FinFET Input/Output (IO) device. Junction profile at drain extension region is a key factor in improving HCI degradation.
Abstract: A novel process optimization tool for grayscale lithography is developed and demonstrated to fabricate three-dimensional (3D) microstructures using thick-film photoresists. For the first ...
A lot of people requested this one for their HyperX Alloy Origins Core because they are concerned that the keyboard can't save rgb profiles or Macros, but it can. Just remember to sync to your ...